发明名称 |
Method of improving etching profile of floating gates for flash memory devices |
摘要 |
A method of forming floating gates for flash memory devices. A plurality of substrates is provided, in which a film to be etched and an overlying masking pattern layer are provided overlying each substrate. Each of the films in a plasma chamber is etched in sequence using the masking pattern layer as an etch mask, a polymer layer being deposited over the inner wall of the plasma chamber during the etching. An intermediary cleaning process is performed in the plasma chamber between the etchings before the deposited polymer layer reaches such a degree as to induce lateral etching on the next film to be etched, thereby improving etching profile of the films.
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申请公布号 |
US7202170(B2) |
申请公布日期 |
2007.04.10 |
申请号 |
US20040760995 |
申请日期 |
2004.01.20 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
LIU KUO-CHIN;LEU CHUNG-LONG;KE MEI-HOU |
分类号 |
H01L21/302;H01L21/28;H01L21/3205;H01L27/11;H01L29/423 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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