发明名称 Phase change memory device and method of forming the same
摘要 A PRAM and method of forming the same are disclosed. In various embodiments, the PRAM includes a lower insulation layer formed on a semiconductor substrate, a phase change material pattern formed on the lower insulation layer and a heating electrode contacting the phase change material pattern. The heating electrode can be formed of a material having a positive temperature coefficient such that specific resistance of the material increases as a function of temperature.
申请公布号 US2007076486(A1) 申请公布日期 2007.04.05
申请号 US20060507573 申请日期 2006.08.22
申请人 JEONG WON-CHEOL;LEE SE-HO;PARK JAE-HYUN;JEONG CHANG-WOOK 发明人 JEONG WON-CHEOL;LEE SE-HO;PARK JAE-HYUN;JEONG CHANG-WOOK
分类号 G11C11/34 主分类号 G11C11/34
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