发明名称 |
Phase change memory device and method of forming the same |
摘要 |
A PRAM and method of forming the same are disclosed. In various embodiments, the PRAM includes a lower insulation layer formed on a semiconductor substrate, a phase change material pattern formed on the lower insulation layer and a heating electrode contacting the phase change material pattern. The heating electrode can be formed of a material having a positive temperature coefficient such that specific resistance of the material increases as a function of temperature.
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申请公布号 |
US2007076486(A1) |
申请公布日期 |
2007.04.05 |
申请号 |
US20060507573 |
申请日期 |
2006.08.22 |
申请人 |
JEONG WON-CHEOL;LEE SE-HO;PARK JAE-HYUN;JEONG CHANG-WOOK |
发明人 |
JEONG WON-CHEOL;LEE SE-HO;PARK JAE-HYUN;JEONG CHANG-WOOK |
分类号 |
G11C11/34 |
主分类号 |
G11C11/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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