| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive paste capable of performing a pattern formation by a single exposure even in the case of a thick film of >50 μm, and having sensitivity slightly affected by an increased amount of glass particles added. <P>SOLUTION: The photosensitive paste comprises: (A) glass particles surface-modified with an organic compound; (B) an alkali-soluble resin or a resin which becomes alkali-soluble by the action of an acid; (C) a compound which generates an acid upon irradiation with ionizing radiation; and (D) an organic solvent as essential components, wherein the organic compound which surface-treats the glass particles comprises an organic high molecular compound having an acid group in a molecule. Barrier ribs for a plasma display using the photosensitive paste and a member for a plasma display equipped with the barrier ribs are also provided. <P>COPYRIGHT: (C)2007,JPO&INPIT |
