发明名称 |
Coating solution for forming high dielectric constant thin film and method for forming dielectric thin film using the same |
摘要 |
Disclosed herein are a coating solution for the formation of a dielectric thin film and a method for the formation of a dielectric thin film using the coating solution. The coating solution comprises a titanium alkoxide, a beta-diketone or its derivative, and a benzoic acid derivative having an electron donating group. The method comprises spin coating the coating solution on a substrate to form a thin film and drying the thin film at a low temperature to crystallize the thin film. The titanium-containing coating solution is highly stable. In addition, the coating solution enables formation of a thin film, regardless of the kind of substrates, and can be used to form dielectric thin films in an in-line mode in the production processes of PCBs.
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申请公布号 |
US2007077457(A1) |
申请公布日期 |
2007.04.05 |
申请号 |
US20060541673 |
申请日期 |
2006.10.03 |
申请人 |
SAMSUNG ELECTRO-MECHANICS CO., LTD. |
发明人 |
BAE JUN H.;KIM SEUNG H.;CHUNG YUL K.;SONG WON H.;LIM SUNG T.;JIN HYUN J. |
分类号 |
B32B9/00;B05D3/02;B05D3/12;B32B19/00 |
主分类号 |
B32B9/00 |
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