| 摘要 |
A method for forming a resist pattern on a substrate ( 18 ) places a donor element ( 12 ) having a layer of thermoresist material proximate the substrate. A gap is maintained such that the surface of the layer of thermoresist material is spaced apart from the surface of the substrate by a number of spacing elements. Thermal energy is directed toward the donor element ( 12 ) according to the resist pattern, whereby a portion of thermoresist material is transferred from the donor element ( 12 ) across the gap by ablative transfer and is deposited onto the substrate ( 18 ) forming the resist pattern.
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