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发明名称
电浆处理方法及电浆处理设备
摘要
尽可能抑制昂贵的氪气、氙气消耗量之同时,亦降低电浆处理时对被处理物造成之损坏。使用稀有气体对基板进行电浆处理时,使用2种以上不同种类之稀有气体。稀有气体中之一种系为廉价之氩气,其他气体则为与电子碰撞剖面积较氩气为大之氪气及氙气之任一种,或为氪气以及氙气,尽可能于抑制昂贵的氪气、氙气消耗量之同时,亦降低电浆处理时对被处理物造成之损坏。
申请公布号
TW200714139
申请公布日期
2007.04.01
申请号
TW094133489
申请日期
2005.09.27
申请人
大见忠弘
发明人
大见忠弘;寺本章伸
分类号
H05H1/24(2006.01);H01L21/3065(2006.01)
主分类号
H05H1/24(2006.01)
代理机构
代理人
周良谋
主权项
地址
日本
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