发明名称 MASKING DEVICE FOR FILM FORMATION
摘要 PROBLEM TO BE SOLVED: To provide a masking device for film formation, which can be easily assembled, eliminates poor insulation or breaking of a wire due to a displacement of a spacer and upper and lower mask sheets, and provides high operatability and reliability. SOLUTION: The masking device for film formation has: the spacer 5 having a through-hole formed therein; a lower mask 4 having a mask pattern corresponding to the through-hole formed therein; an upper mask 6 having a mask pattern corresponding to the through-hole formed therein; a top plate 7 for pressing the mask; and the bottom plate 1 for pressing the mask. A specific component of the masking device for film formation has a base guide pin 33 to be fixed on a plate surface of a component, and two or more fixed guide pins 35 and 36 formed thereon. The other component of the masking device for film formation has a guiding hole for engagement and a positioning hole formed therein. The vertex of the fixed guide pin to be inserted into the guiding hole is formed so as to be approximately parallel to the top face of the upper mask. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007077471(A) 申请公布日期 2007.03.29
申请号 JP20050268719 申请日期 2005.09.15
申请人 DAISHINKU CORP 发明人 IGUCHI TOMOYA;INOUE NAOKAZU
分类号 C23C14/04;H03H3/02 主分类号 C23C14/04
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