发明名称 Vacuum processing apparatus and vacuum processing method
摘要 The downtime of a vacuum processing apparatus due to wet cleaning is reduced. In a vacuum processing apparatus that requires aging for its chamber or process container after vacuum evacuation of the apparatus and before actual processing of a workpiece, when the chamber has been opened to atmosphere for the purpose of wet cleaning or component replacement, the apparatus comprises a high precision absolute pressure gauge for use in processing, a wide range gauge capable of measuring a wide range of pressures, and a controller, wherein the controller uses a pressure trend during vacuum evacuation to determine whether the vacuum evacuation is satisfactory, and starts aging upon determining that the vacuum evacuation is satisfactory even if the actual pressure is not below a prescribed value. The controller determines relationship between an apparent flow rate (leak rate) measured by the absolute pressure gauge when the chamber is vacuum sealed, and a chamber pressure measured by the wide range gauge, and then measures only the pressure to determine whether a baseline leak rate is reached.
申请公布号 US7194821(B2) 申请公布日期 2007.03.27
申请号 US20050068804 申请日期 2005.03.02
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 EDAMURA MANABU;MAKINO AKITAKA;YOSHIGAI MOTOHIKO;NAKATSUKA TAKANORI;TAUCHI SUSUMU
分类号 F26B7/00 主分类号 F26B7/00
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