发明名称 METHOD OF THINNING SUBSTRATE AND METHOD OF MANUFACTURING CIRCUIT ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a method of thinning a substrate which can reduce transfer of a groove trace of a support plate onto a substrate, and can reduce the generation of cutting unevenness on the substrate, and to provide a method of manufacturing a circuit element. SOLUTION: The surface of a support plate 1 integrated with a semiconductor wafer W by an adhesive 2 where a sheet 6 is pasted is placed on the top surface of a suction head 7, and is sucked and fixed. Then, the top surface of the semiconductor wafer W (surface where a circuit is not formed) is ground in this state by a grinder 8. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007073798(A) 申请公布日期 2007.03.22
申请号 JP20050260284 申请日期 2005.09.08
申请人 TOKYO OHKA KOGYO CO LTD 发明人 NAKAMURA AKIHIKO;INAO YOSHIHIRO;MIYANARI ATSUSHI
分类号 H01L21/304;H01L21/301 主分类号 H01L21/304
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