发明名称 GAS PROCESSING APPARATUS AND CARTRIDGE FOR GAS PROCESSING
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a gas processing apparatus in which the damage of a dielectric due to shock is prevented, stable electric field is formed by the improvement of the contact state and the adhesion of an electrode with the dielectric and relatively high processing efficiency is attained and a cartridge for gas processing. <P>SOLUTION: The gas processing apparatus has electrodes 4a, 4b, 4c, 5a, 5b for inducing the discharge with the application of voltage, dielectric members 6a, 6b, 6c, 6d formed to pass a gas G1 to be processed and provided with among the electrodes and a plasma processing chamber 1b in which the electrodes and the dielectric members are mounted inside. The gas is processed by introducing the gas to be processed into the plasma processing chamber 1b in which plasma is generated by inducing the discharge between the electrodes. At least one side of the electrodes is formed from a flexible conductive material so that the surface of the electrode is nearly matched with the shape of the dielectric member surface when the surface of the electrodes is brought into contact with the surface of the dielectric member and the electrode surface is deformed with the deformation of the dielectric member surface to keep the contact state. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2007069115(A) 申请公布日期 2007.03.22
申请号 JP20050258589 申请日期 2005.09.06
申请人 CANON INC 发明人 KANEKO YOSHIAKI;NISHIGUCHI TOSHIMOTO;IWAMA HIDEO;TAMURA JUNICHI
分类号 B01D53/44;B01J19/08;B01J20/02 主分类号 B01D53/44
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