| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a mask blank housing case suitable for a mask blank having resist film that requires to be stored in a clean atmosphere, and capable of maintaining stable resist performance for forming a desired mask pattern, and to provide a method for housing a mask blank and a mask blank housing body. <P>SOLUTION: The mask blank housing case to house a mask blank exhibits properties, such that when an extracted solution, obtained by hot water extraction of the mask blank housing case, is measured by ion chromatography under anion measurement conditions, the number of peaks in a retention period of 2.8 minutes to 15 minutes is fewer than 13, and the ratio of the peak areas in the retention period of 2.8 minutes to 15 minutes to a peak area of sulfuric acid ion standard solution is smaller than 15. The mask blank housing case is made of a material that essentially comprises acrylic resin. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
