| 发明名称 |
Set of at least two masks for the projection of structure patterns and method for producing the masks |
| 摘要 |
A set of at least two masks for the projection of structure patterns, coordinated with one another, by a projection system into the same photosensitive layer of a semiconductor wafer can include a second mask.
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| 申请公布号 |
US2004202943(A1) |
申请公布日期 |
2004.10.14 |
| 申请号 |
US20040791763 |
申请日期 |
2004.03.04 |
| 申请人 |
DETTMANN WOLFGANG;THIELE JORG;PFORR RAINER;HENNIG MARIO;ZEILER KARSTEN |
发明人 |
DETTMANN WOLFGANG;THIELE JORG;PFORR RAINER;HENNIG MARIO;ZEILER KARSTEN |
| 分类号 |
G03F1/00;G03F1/14;G03F7/20;(IPC1-7):G03F9/00 |
主分类号 |
G03F1/00 |
| 代理机构 |
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