SUBSTRATE FOR FORMATION OF PATTERN FILM, ITS MANUFACTURING METHOD AND ELECTRO-OPTICAL DEVICE AND ELECTRONIC INSTRUMENT

摘要

PROBLEM TO BE SOLVED: To provide a substrate for formation of a pattern film which permits equalization of the film thickness, its manufacturing method and an electro-optical device and electronic instrument using it.

SOLUTION: The method has a thin film forming process (Fig.3(a)) of forming a positive hole injection film 20a by forming the material of a positive hole injection layer 20 into a thin film of a nearly uniform film thickness as a pattern film, a solvent discharging process (Fig.3 (b)) of discharging the first solvent 25 dissolving the hole injection film 20a toward unnecessary parts in the area where the hole injection film 20a is formed so as to form the positive hole injection layer 20 as a pattern film in parts other than the unnecessary parts and a drying process (Fig.3 (c)) of drying the positive hole injection layer 20.

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