发明名称 Method of Forming a Nanoporous Dielectric Film
摘要 A method comprising forming a coating solution which comprises a matrix precursor material, a porogen material and a solvent, by selecting a polyarylene matrix precursor material which cross-links to form a matrix with a calculated cross-link moeity density of at least 0.003 moles/ml, and reacting the polyarylene matrix precursor material with a porogen which is linear oligomer or polymer which is formed from monomers comprising alkenyl or alkynyl functional monomers, which has reactive end groups and a weight average molecular weight in the range of less than about 5000, where the porogen is present in amounts in the range of about 10 to less than 50 percent by weight based on total weight of porogens and matrix precursor material.
申请公布号 KR20070031326(A) 申请公布日期 2007.03.19
申请号 KR20067025868 申请日期 2004.06.10
申请人 发明人
分类号 C08J9/22;C08J5/18;C08J7/04;C08J9/26;C08L65/00 主分类号 C08J9/22
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