| 摘要 |
PROBLEM TO BE SOLVED: To prevent the dimensional expansion of an aluminum wiring after the etching of the aluminum wiring when forming the aluminum wiring to connect with the gate electrode of an output transistor from a stray capacitance, and to prevent the increase of wire capacitance. SOLUTION: For the method of manufacturing the electric charge detector, first, a resist 21a for the aluminum wiring and resists 21b for dummy patterns are formed as shown in Fig. 3(b) on an aluminum film 23 after performing resist development. Then, main etching and over-etching are performed using a dry etching device as shown in Fig. 3(c). While the foregoing is performed, a dummy pattern 25 is formed near an aluminum wiring pattern 24 due to the existence of the resist 21a for the aluminum wiring and resists 21b for dummy patterns. The dummy patterns 25 prevent the side wall sticking of products generated during etching to the aluminum wiring pattern 24, thereby preventing the dimensional expansion of an aluminum wiring 8 by etching. COPYRIGHT: (C)2007,JPO&INPIT
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