PHOTOMASK FOR THE FABRICATION OF A DUAL DAMASCENE STRUCTURE AND METHOD FOR FORMING THE SAME

摘要

A photomask for the fabrication of dual damascene structures and a method for forming the same are provided. A method for fabricating a multilayer step-and-print lithography (SFIL) template includes providing a blank having a substrate, a metallization layer and a first resist layer. A metal layer pattern of a dual damascene structure is formed in the substrate at a first depth using a lithography system. The first resist layer is removed from the blank and a second resist later is applied. The lithography system is used to form a via layer pattern of the dual damascene structure at the first depth while the first pattern is simultaneously etched to a second depth. The first and second patterns correspond to features to be formed in multiple layers of a device using an SFIL process.