VAPOR DEPOSITION APPARATUS, VAPOR DEPOSITION METHOD, OPTICAL ELEMENT, AND CHIRAL SENSOR

摘要

This invention provides a vapor deposition apparatus, which can prepare a high-purity L-isoleucine crystal on a substrate by a dry process while controlling the film thickness with high accuracy, a vapor deposition method, an optical element, and a chiral sensor. A substrate (2) is held at a predetermined substrate distance and a substrate angle ? within a vacuum chamber (4), and the degree of vacuum within the vacuum chamber (4) and the voltage from application means (7) each are set to a predetermined value. According to the above constitution, a starting material (10) for vapor deposition heated by a heating part (6) for a starting material for vapor deposition can be vaporized, and the vaporized starting material (10) for vapor deposition can be allowed to reach the substrate (2). Thus, a high-purity L-isoleucine crystal can be prepared on the substrate (2) by a dry process while controlling the film thickness with a high accuracy.