发明名称 |
ADAMANTANE DERIVATIVE AND PROCESS FOR PRODUCING THE SAME |
摘要 |
<p>An adamantane derivative useful as a monomer for functional resins such as photosensitive resins in the field of photolithography. The adamantane derivative has a structure represented by the general formula (I) or (IV). In the formulae, R represents hydrogen, methyl, or trifluoromethyl; Y represents C<SUB>1-10</SUB> alkyl, halogeno, or hydroxy, provided that two Y's in combination may represent =O and when two or more Y's are present, then the Y's may be the same or different; R<SUP>1</SUP> represents a C<SUB>2-20</SUB> hydrocarbon group containing at least one hydroxy group; k is an integer of 0-14; and m and n each independently is 0 or 1. (I) (IV)</p> |
申请公布号 |
WO2007029442(A1) |
申请公布日期 |
2007.03.15 |
申请号 |
WO2006JP315642 |
申请日期 |
2006.08.08 |
申请人 |
IDEMITSU KOSAN CO., LTD.;ONO, HIDETOSHI;HATAKEYAMA, NAOYOSHI;OKADA, YASUNARI;ITO, KATSUKI |
发明人 |
ONO, HIDETOSHI;HATAKEYAMA, NAOYOSHI;OKADA, YASUNARI;ITO, KATSUKI |
分类号 |
C07C309/00;C07C67/00;C07C69/00;C07C303/00;C08F20/00;G03F7/00 |
主分类号 |
C07C309/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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