发明名称 ADAMANTANE DERIVATIVE AND PROCESS FOR PRODUCING THE SAME
摘要 <p>An adamantane derivative useful as a monomer for functional resins such as photosensitive resins in the field of photolithography. The adamantane derivative has a structure represented by the general formula (I) or (IV). In the formulae, R represents hydrogen, methyl, or trifluoromethyl; Y represents C&lt;SUB&gt;1-10&lt;/SUB&gt; alkyl, halogeno, or hydroxy, provided that two Y's in combination may represent =O and when two or more Y's are present, then the Y's may be the same or different; R&lt;SUP&gt;1&lt;/SUP&gt; represents a C&lt;SUB&gt;2-20&lt;/SUB&gt; hydrocarbon group containing at least one hydroxy group; k is an integer of 0-14; and m and n each independently is 0 or 1. (I) (IV)</p>
申请公布号 WO2007029442(A1) 申请公布日期 2007.03.15
申请号 WO2006JP315642 申请日期 2006.08.08
申请人 IDEMITSU KOSAN CO., LTD.;ONO, HIDETOSHI;HATAKEYAMA, NAOYOSHI;OKADA, YASUNARI;ITO, KATSUKI 发明人 ONO, HIDETOSHI;HATAKEYAMA, NAOYOSHI;OKADA, YASUNARI;ITO, KATSUKI
分类号 C07C309/00;C07C67/00;C07C69/00;C07C303/00;C08F20/00;G03F7/00 主分类号 C07C309/00
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