发明名称 SEMICONDUCTOR FILM FORMING PAINT, PHOTOELECTRIC CELL ELECTRODE, ITS MANUFACTURING METHOD AND PHOTOELECTRIC CELL
摘要 <P>PROBLEM TO BE SOLVED: To provide a semiconductor film forming paint with which a semiconductor film can be deposited at a low temperature, a plastic film can be used as a substrate, and the semiconductor film can continuously be produced; and to provide a photoelectric cell electrode, a manufacturing method of the electrode, and the photoelectric cell using the method. <P>SOLUTION: Semiconductor film forming paint comprises zinc oxide particles, coumarin system colorant, binding agent, and solvent. The photoelectric cell electrode 10 has a transparent substrate 11, a transparent conductive film 12 formed on the transparent substrate 11, and a semiconductor film 13 where semiconductor film forming paint is applied onto the transparent conductive film 12. The photoelectric cell is provided with the photoelectric cell electrode 10, and a counterelectrode 20 arranged in a position confronted with the semiconductor film 13 of the photoelectric cell electrode 10. A part between the photoelectric cell electrode 10 and the counterelectrode 20 is filled with an electrolyte material 30. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007067046(A) 申请公布日期 2007.03.15
申请号 JP20050249013 申请日期 2005.08.30
申请人 TOMOEGAWA PAPER CO LTD;NATIONAL UNIV CORP SHIZUOKA UNIV 发明人 TOTSUKA HIROMI;SANO TAKAYUKI;KONNO AKINORI
分类号 H01L31/04;C09D7/12;H01M14/00 主分类号 H01L31/04
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