发明名称 FILM-LIKE INTERCONNECT LINE TAPE AND ITS MANUFACTURING METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a film-like interconnect line tape which is low in restoration stress in the state of bent, and can be stuck to a semiconductor member such as a chip or the like even at relatively low temperature. <P>SOLUTION: The film-like interconnect line tape is constituted by an interconnect line pattern layer, adhesives layer, and insulating film locating between the above 2 layers. The above-mentioned adhesives layer locates at an outer-most layer of the above-mentioned film-like interconnect line tape, its Tg is 120°C or less, and even in the inflexible state, the tape can be suitably stuck to the semiconductor member such as a semiconductor chip or the like in the state of plane by utilizing a property capable of sticking at low temperature. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2007067245(A) 申请公布日期 2007.03.15
申请号 JP20050252891 申请日期 2005.08.31
申请人 SUMITOMO BAKELITE CO LTD 发明人 TERAI TATEO
分类号 H01L21/60;C09J7/02;C09J163/00;C09J179/08;C09J183/04;H01L23/12 主分类号 H01L21/60
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