| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a target having a reduced indium content with which abnormal discharge generated upon the deposition of a transparent electrically conductive film using a sputtering process is suppressed, and sputtering can be stably performed; to provide a transparent electrically conductive film using the target; and to provide a transparent electrode. <P>SOLUTION: The sputtering target is a sintered compact of oxide at least comprising indium, tin and zinc, and including a compound with a spinel structure expressed by Zn<SB>2</SB>SnO<SB>4</SB>and a compound with a bixbyite structure expressed by In<SB>2</SB>O<SB>3</SB>. The production method uses the same. The transparent electrically conductive film and the transparent electrode are obtained by using the same. <P>COPYRIGHT: (C)2007,JPO&INPIT |
