APPARATUS FOR CLEANING DONOR FILM AND METHOD THEREOF

摘要

An apparatus and a method for cleaning a donor film are provided to improve an adhesive force between the donor film and an interface of a light emitting layer by removing a particle of the donor film. An apparatus for cleaning a donor film(130) includes a chamber, an anode(100), a cathode(110), a power supplier(120), and an insulation unit. The chamber receives a reactive gas. The anode(100) is installed in the chamber. A predetermined voltage is applied to the anode(100). The cathode(110) is installed to be separated from the anode(100) by a predetermined distance. A predetermined voltage is applied to the cathode(110) so that the reactive gas is converted into a plasma state. The power supplier(120) applies a voltage to the anode(100) and the cathode(110). The insulation unit holds a donor film(130) to be located between the anode(100) and the cathode(110).