发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME
摘要 PROBLEM TO BE SOLVED: To improve the reliability in a semiconductor device including a flash memory having an auxiliary gate electrode structure. SOLUTION: The device includes: a plurality of auxiliary gate electrodes AG which are formed on the main surface of a semiconductor board 1 through a gate insulating film 2; floating gate electrodes FG which are formed to be insulated electrically from the auxiliary gate electrodes AG by side wall insulating films 4 formed on the side walls of the auxiliary gate electrodes AG, and are formed through the gate insulating films 2; and a plurality of control gate electrodes CG which are formed on inter-layer dielectrics 5 formed to cover the floating gate electrodes FG. The surface of the interlayer dielectrics 5 has irregular shape. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007067223(A) 申请公布日期 2007.03.15
申请号 JP20050252300 申请日期 2005.08.31
申请人 RENESAS TECHNOLOGY CORP 发明人 SHIOTANI KENICHI;OGASAWARA MAKOTO;TAKEUCHI TAKASHI
分类号 H01L21/8247;H01L27/10;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/8247
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