发明名称 |
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME |
摘要 |
PROBLEM TO BE SOLVED: To improve the reliability in a semiconductor device including a flash memory having an auxiliary gate electrode structure. SOLUTION: The device includes: a plurality of auxiliary gate electrodes AG which are formed on the main surface of a semiconductor board 1 through a gate insulating film 2; floating gate electrodes FG which are formed to be insulated electrically from the auxiliary gate electrodes AG by side wall insulating films 4 formed on the side walls of the auxiliary gate electrodes AG, and are formed through the gate insulating films 2; and a plurality of control gate electrodes CG which are formed on inter-layer dielectrics 5 formed to cover the floating gate electrodes FG. The surface of the interlayer dielectrics 5 has irregular shape. COPYRIGHT: (C)2007,JPO&INPIT
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申请公布号 |
JP2007067223(A) |
申请公布日期 |
2007.03.15 |
申请号 |
JP20050252300 |
申请日期 |
2005.08.31 |
申请人 |
RENESAS TECHNOLOGY CORP |
发明人 |
SHIOTANI KENICHI;OGASAWARA MAKOTO;TAKEUCHI TAKASHI |
分类号 |
H01L21/8247;H01L27/10;H01L27/115;H01L29/788;H01L29/792 |
主分类号 |
H01L21/8247 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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