发明名称 Optical element for use in lithography apparatus and method of conditioning radiation beam
摘要 An optical element for effecting a desired change in incident radiation at a plane of an illumination system of a lithographic apparatus comprises an array of cells manufactured as a single unit, each cell being arranged to redirect the incident radiation in a predetermined direction. An array of polarizing regions is also provided, each polarizing region being associated with a corresponding cell. Each cell arranged to redirect radiation in a first direction has associated with it a polarizing region ensuring that the redirected radiation has a first polarization, so that all of the radiation redirected in the first direction has the same polarization.
申请公布号 US2007058151(A1) 申请公布日期 2007.03.15
申请号 US20050224319 申请日期 2005.09.13
申请人 CARL ZEISS SMT AG 发明人 EURLINGS MARKUS FRANCISCUS A.;VAN DAM MARINUS J.M.;VAN GREEVENBROEK HENDRIKUS R.M.;KNOLS EDWIN W.M.;MULDER HEINE M.;MARIA SWINKELS GERARDUS H.P.;FIOLKA DAMIAN
分类号 G03B27/72 主分类号 G03B27/72
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