首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
Method of forming multi-level coplanar metal/insulator films using dual damascene with sacrificial flowable oxide
摘要
申请公布号
EP0895283(B1)
申请公布日期
2007.03.14
申请号
EP19980110307
申请日期
1998.06.05
申请人
INFINEON TECHNOLOGIES AG
发明人
FELDNER, KLAUS;GREWAL, VIRINDER;VOLLMER, BERND;SCHNABEL, RAINER FLORIAN
分类号
H01L21/302;H01L21/28;H01L21/768;H01L21/3065;H01L21/3205
主分类号
H01L21/302
代理机构
代理人
主权项
地址
您可能感兴趣的专利
PROCESSO PARA A PREPARACAO DE COMPOSICOES PARA RETARDAR O CRESCIMENTO DE PLANTAS CONTENDO COMPOSTOS DERIVADOS DE ACIDO MALONICO, ASSIM COMO DE NOVOS DERIVADOS DE ACIDO MALONICO
SADDLE PILLAR RESILIENTLY MOUNTED ON A BICYCLE FRAME IN THE DIRECTION OF THE REAR AXLE
Frame for pictures or the like
Fuze device for detonating a pyrotechnic charge
Roadway support machine with combined drilling and support-setting apparatus
Method and device for drying newly moulded perforated bricks
Punching apparatus with a plurality of punch bails
Roller block
Sealing arrangement
Method and circuit arrangement for identifying and testing the genuineness of all kinds of specific features
Screwless butt connection of abutting cable ducts
Cable terminal box or cable junction box
DIFFERENTIELLER INDUKTIVER GEBER MIT DIGITALAUSGANG
Seal for a canister
Rear-wheel suspension for motorcycles
FILMKASSETTE
Punching tool for insertion between the ram and the bolster of a press
Apparatus for gel electrophoresis, in particular fluorescence gel electrophoresis
Piston/cylinder unit of plastic
Pump for pressures exceeding a thousand bar
