| 发明名称 |
(METH)ACRYLATE, POLYMER AND RESIST COMPOSITION |
| 摘要 |
Disclosed is a polymer containing a constitutional unit having a specific acetal skeleton. This polymer can be used as a resist resin in DUV excimer laser lithography, electron beam lithography, EUV lithography or the like. ® KIPO & WIPO 2007
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| 申请公布号 |
KR20070027597(A) |
申请公布日期 |
2007.03.09 |
| 申请号 |
KR20067026640 |
申请日期 |
2006.12.18 |
| 申请人 |
MITSUBISHI RAYON CO., LTD. |
发明人 |
OOTAKE ATSUSHI;NAKAMURA TADASHI |
| 分类号 |
C08F20/26;C08F20/00;C08F20/28;G03F7/039 |
主分类号 |
C08F20/26 |
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