PHOTORESIST COATING APPARATUS AND METHOD

摘要

A photoresist coating apparatus and a method are provided to prevent the generation of an edge bead by restraining a photoresist solution from being vaporized at a wafer edge using a magnetic field generating unit. A photoresist coating apparatus includes a solvent ionizing unit and a magnetic field generating unit. The solvent ionizing unit is used for supplying an ionized solvent vapor. The magnetic field generating unit(505) is used for forming a solvent vapor layer on a wafer by using the ionized solvent vapor supplied from the solvent ionizing unit. The magnetic field generating unit is composed of at least one or more electromagnets and an electromagnet control part.