发明名称 Verfahren zur Herstellung einer Photonic-Band-Gap-Struktur und Bauelement mit einer derartig hergestellten Photonic-Band-Gap-Struktur
摘要 Created so as to conform to each other, first coplanar wave conductor metal coatings (3,3') are applied to the surfaces of two substrates (1,1'). These coatings are brought into contact with each other. In a structured manner, the two substrates are etched at the back away from the surfaces of the two substrates opposite the coplanar wave conductor metal coatings. - An INDEPENDENT CLAIM is also included for a component for use in a microwave and/or dwarf wave range or in a high frequency range with a main substrate and a photonic band gap structure.
申请公布号 DE102004022140(B4) 申请公布日期 2007.03.08
申请号 DE20041022140 申请日期 2004.05.05
申请人 ATMEL GERMANY GMBH 发明人 JOODAKI, MOJTABA
分类号 H01P11/00;H01P1/20;H01P1/201;H01P7/06 主分类号 H01P11/00
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