发明名称 VACUUM CHAMBER AND VACUUM PROCESSING APPARATUS
摘要 A vacuum chamber and a vacuum processing apparatus are provided to secure intensity of the vacuum chamber itself enough by using a pair of reinforcing frame bodies. A vacuum chamber includes a main frame body, at least one pair of reinforcing frame bodies, and a predetermined plate. The main frame body(201) is formed like a polygon type structure. The main frame body includes a bottom plate for forming a bottom portion and an opening portion at an upper portion. The pair of reinforcing frame bodies(202a,202b) are bonded to side portions opposite to the main frame body. The predetermined plate(203) is capable of being attached/detached to/from an upper portion of the main frame body.
申请公布号 KR20070026215(A) 申请公布日期 2007.03.08
申请号 KR20060083845 申请日期 2006.08.31
申请人 TOKYO ELECTRON LIMITED 发明人 OKABE SEIJI
分类号 H01L21/68;C23C14/00;C23C14/56;C23C16/44;C23C16/54;H01J11/02;H01L21/3065;H01L21/677 主分类号 H01L21/68
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