| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and an apparatus for performing vacuum vapor deposition of an organic material capable of preventing thermal degradation of the organic material stored in a vapor deposition source, enhancing the productivity, and consistently controlling the vapor deposition rate for a long time. SOLUTION: In the vacuum vapor deposition method, an evaporation substance 5 from a vapor deposition source 20 having a container 1 for storing an organic material 2 with one side thereof being open is film-deposited on a substrate 7 facing thereto. The vapor deposition source has a heating body 3 which is not fixed to the container but closes an opening of the container, and is brought into contact with a surface of the organic material in the container. The organic material is evaporated by heating only the heating body, and the evaporation substance is emitted from at least one hole 6 or at least one slit formed in the heating body. COPYRIGHT: (C)2007,JPO&INPIT
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