发明名称 METHOD OF INSPECTING MICROCIRCUIT
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of inspecting a microcircuit capable of discriminating the foreign substance and unevenness on a microcircuit pattern to detect only the microcircuit. <P>SOLUTION: The method has an imaging step for imaging the microcircuit becoming an inspection target a flaw candidate point selecting step for setting an inspection region to the differential image of the microcircuit imaged in the imaging step to perform raster scanning and selecting pixel having a differential value more than a predetermined value as a flaw candidate point a pixel row setting step, for setting a pixel row for inspection with a predetermined width on the basis of the flaw candidate point, a differential directional value setting step for setting a differential directional value showing the change direction of the differential value with respect to the flaw candidate point and a contamination decision step for deciding the flaw candidate point as contamination when the same differential directional value as the differential directional value of the flaw candidate point is not present in the pixel row for inspection. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007057441(A) 申请公布日期 2007.03.08
申请号 JP20050244910 申请日期 2005.08.25
申请人 MATSUSHITA ELECTRIC WORKS LTD 发明人 SHIRASAWA MITSURU
分类号 G01N21/956;G06T1/00;H01L21/66 主分类号 G01N21/956
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