| 摘要 |
PROBLEM TO BE SOLVED: To clean a semiconductor wafer at a stable cleaning force by well reproduceably setting the push-in quantity of brushes into the wafer in a cleaning operation. SOLUTION: The cleaner comprises a drive mechanism for changing the relative positions of brushes 120, 130 to a wafer holder 110, detectors 150, 160 for detecting the top end positions of the brushes 120, 130 at the semiconductor wafer W side, and a controller 170 for controlling the drive mechanism to change the relative positions by set travel distances from the initial positions of the brushes 120, 130 to the push-in positions. The detectors 150, 160 detect the top end positions of the brushes 120, 130 approaching to the detect position at a specified distance from the surface of the wafer W. The controller 170 sets the set travel distance, based on the detect results of the detectors 150, 160. COPYRIGHT: (C)2007,JPO&INPIT
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