PLASMA PROCESSING EQUIPMENT, PLASMA PROCESSING METHOD, DIELECTRIC WINDOW FOR USE THEREIN AND METHOD FOR PRODUCING THE SAME

摘要

Plasma doping exhibiting excellent uniformity is achieved. While a predetermined gas is introduced into a vacuum container (1) from gas supply units (2, 16), the vacuum container (1) is evacuated through an exhaust opening (11) by means of a turbo molecular pump (3) as an exhauster and a predetermined pressure in sustained in the vacuum container (1) by means of a pressure regulation valve (4). Induction coupling plasma is generated in the vacuum container (1) by supplying high frequency power of 13.56 MHz from a high frequency power supply (5) to a coil (8) provided in proximity of a dielectric window (7) opposing a sample electrode (6). The dielectric window (7) consists of a plurality of dielectric plates and a groove is formed in at least one side of at least two dielectric plates opposing each other. A gas channel is formed by the groove and the opposing flat surfaces thereof, and gas supply openings (15, 19) provided in a dielectric plate closest to the sample electrode are allowed to communicate with the groove in the dielectric window. Flow rate of gas introduced from the gas supply openings (15, 19) can be controlled independently and uniformity of processing can be enhanced.