| 摘要 |
PROBLEM TO BE SOLVED: To provide a silicon wafer for a test having excellent performance, which avoids a damage caused by plasma discharge, prevents contamination in a vacuum chamber caused by heavy metal gas, and uses one silicon wafer for the test repeatedly several times. SOLUTION: A temperature display 7 changed from in a clouded opaque state into a transparent or translucent state when reaching a set temperature determined beforehand is fixed on a desired position of a wafer body 3, and the upper part is covered with a heat-resistant resin layer 11, to thereby constitute the silicon wafer for the test. COPYRIGHT: (C)2007,JPO&INPIT
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