发明名称 CHAMBER FOR VACUUM TREATMENT
摘要 <p>A chamber for vacuum treatment enabling the simplification of the arrangement structure of a flow passage for cooling. The chamber for vacuum treatment comprises a plurality of wall members (1, 2, 3, 4, 11, 12, 13). Parts of the surfaces of the wall members (1, 2, 3, 4, 11, 12, 13) form bonded surfaces, and the plurality of wall members (1, 2, 3, 4, 11, 12, 13) are bonded to each other through bonding parts (10) formed by bonding airtight the bonded surfaces to each other to form a chamber body (100). At least parts of the bonding parts (10) are the bonding parts (10) with built-in spaces in which clearances (30, 31) extending along the bonded surfaces are formed in the bonded surfaces, and the peripheries of the bonded surfaces are bonded airtight to each other by welding.</p>
申请公布号 WO2007026479(A1) 申请公布日期 2007.03.08
申请号 WO2006JP314499 申请日期 2006.07.21
申请人 FUKUDA, YOSHIMITSU;SHINMAYWA INDUSTRIES, LTD.;IWASAKI, YASUKUNI;MIYAZAKI, OSAMU 发明人 IWASAKI, YASUKUNI;FUKUDA, YOSHIMITSU;MIYAZAKI, OSAMU
分类号 C23C14/56;C23C16/44 主分类号 C23C14/56
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