发明名称 Vacuum processing system
摘要 A ceramic film is formed by a spray method on a base material of an electrostatic attraction device. Electrode films for electrostatic attraction are formed by a spray method on a surface of the ceramic film. A ringular heater film is formed in a spray method between the electrode films in a radial direction of the electrode films. In addition, a ceramic film is formed by a spray method on upper surfaces of the electrode films and the heater film.
申请公布号 US2007044916(A1) 申请公布日期 2007.03.01
申请号 US20050214951 申请日期 2005.08.31
申请人 ISOZAKI MASAKAZU;KANNO SEIICHIRO;KIHARA HIDEKI;KITADA HIROHO 发明人 ISOZAKI MASAKAZU;KANNO SEIICHIRO;KIHARA HIDEKI;KITADA HIROHO
分类号 C23F1/00;C23C16/00 主分类号 C23F1/00
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