发明名称 METAL MASK FOR CRYSTAL ELECTRODE DEPOSITION
摘要 PROBLEM TO BE SOLVED: To obtain a metal mask for crystal electrode deposition which has no washing stain after drying by improving removal of washing liquid when a crystal plate is washed. SOLUTION: The metal mask for crystal electrode deposition comprising a lower frame tool having an opening part in which a magnet is buried, a lower electrode metal mask having an electrode pattern opening part, an intermediate plate having an opening part in which the crystal plate is charged, and an upper metal mask having an electrode pattern opening part is constituted by burying many shape memory alloys in the intermediate plate. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007053570(A) 申请公布日期 2007.03.01
申请号 JP20050237111 申请日期 2005.08.18
申请人 EPSON TOYOCOM CORP 发明人 KONNO HITOSHI;ANZAI FUMIO;TAKAHASHI MASAMI
分类号 H03H3/02 主分类号 H03H3/02
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