| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To suppress dishing or erosion in polishing of an metal-exposed surface. <P>SOLUTION: The polishing composition contains (A) an anionic surfactant including (x) a polyoxyethylene structure and (y) an unsaturated hydrocarbon structure, in a molecule. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
