| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a film deposition method where an oxide film or a nitride film can be deposited on a base material composed of a carbon material such as a crystalline carbon material or an amorphous carbon material. <P>SOLUTION: The surface of a substrate composed of a carbon material such as a diamond substrate in which a diamond thin film is deposited on a single crystal diamond base material is subjected to plasma treatment, radical treatment, chemical treatment or treatment in which they are combined, thus oxygen and/or nitrogen is adsorbed thereon. Thereafter, an oxide film or a nitride film is deposited on the surface of the diamond substrate with the oxygen and/or nitrogen adsorbed by an atomic layer deposition process where an organic metal compound and an oxidizing agent or a nitriding agent are alternately fed. <P>COPYRIGHT: (C)2007,JPO&INPIT |
