| 摘要 |
In a non-volatile memory device having a relatively high operation performance and a method of manufacturing the same, a substrate may be prepared to include an active region on which a conductive structure is located and defined by a field region in which an isolation layer is formed. A tunnel oxide layer may be formed on the active region of the substrate. A floating gate pattern may be formed on the tunnel oxide layer, and may include a lower part having a first width that is formed on the tunnel oxide layer and an upper part having a second width that is formed on the lower part, where the second width is substantially smaller than the first width. A dielectric layer pattern may be formed on the floating gate pattern, and a control gate pattern may be formed on the dielectric layer pattern. Accordingly, the non-volatile memory device may have an improved efficiency in programming and erasing data.
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