发明名称 |
Capacitor, method of manufacturing the same, method of manufacturing ferroelectric memory device, method of manufacturing actuator, and method of manufacturing liquid jet head |
摘要 |
A method of manufacturing a capacitor, including: forming a lower electrode on a substrate; forming a dielectric film of a ferroelectric or a piezoelectric on the lower electrode; forming an upper electrode on the dielectric film; and forming a silicon oxide film so that at least the dielectric film is covered with the silicon oxide film, the silicon oxide film being formed by using trimethoxysilane.
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申请公布号 |
US2007048880(A1) |
申请公布日期 |
2007.03.01 |
申请号 |
US20060502854 |
申请日期 |
2006.08.11 |
申请人 |
SEIKO EPSON CORPORATION |
发明人 |
KOBAYASHI DAISUKE;NAKAYAMA MASAO |
分类号 |
H01L21/00;H01L21/8242 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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