| 发明名称 |
PREVENTING DEVICE AND METHOD FOR SENSITIVE-LIQUID IN SLIT-NOZZLE |
| 摘要 |
<p>An apparatus and a method for preventing cure of a photoresist of a photoresist slit nozzle are provided to coat uniformly the photoresist by preventing the cure of the photoresist within a photoresist coating nozzle in a standby state. A reception unit(41) stores an anti-curing solution and receives a slit(31) of a photoresist coating nozzle(30). A slit contact member(43) is used for contacting the anti-curing solution with an end of the photoresist coating nozzle. One end of the slit contact member is fixed to a bottom surface of the reception unit. A slope is formed on the other end of the slit contact member in order to be in contact with a lateral surface of the photoresist coating nozzle.</p> |
| 申请公布号 |
KR100691481(B1) |
申请公布日期 |
2007.02.28 |
| 申请号 |
KR20060039454 |
申请日期 |
2006.05.02 |
| 申请人 |
K.C.TECH CO., LTD. |
发明人 |
KWON, SEONG;KIM, JU HYANG;PARK, WOON YONG |
| 分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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