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经营范围
发明名称
chamber structure for use in plasma dry etching equipment
摘要
申请公布号
KR20070022521(A)
申请公布日期
2007.02.27
申请号
KR20050076813
申请日期
2005.08.22
申请人
发明人
分类号
H01L21/3065
主分类号
H01L21/3065
代理机构
代理人
主权项
地址
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