发明名称 |
Processing apparatus using focused charged particle beam |
摘要 |
A sample to be observed or processed with a focused charged particle beam is formed small, and only the micro sample is locally cooled. Alternatively, a sample mount part is used which has the structure that can relax a thermal drift.
|
申请公布号 |
US2007040128(A1) |
申请公布日期 |
2007.02.22 |
申请号 |
US20060501629 |
申请日期 |
2006.08.09 |
申请人 |
YAMAMOTO YO;TAKAHASHI HARUO;FUJII TOSHIAKI |
发明人 |
YAMAMOTO YO;TAKAHASHI HARUO;FUJII TOSHIAKI |
分类号 |
H01J37/20 |
主分类号 |
H01J37/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|