发明名称 Processing apparatus using focused charged particle beam
摘要 A sample to be observed or processed with a focused charged particle beam is formed small, and only the micro sample is locally cooled. Alternatively, a sample mount part is used which has the structure that can relax a thermal drift.
申请公布号 US2007040128(A1) 申请公布日期 2007.02.22
申请号 US20060501629 申请日期 2006.08.09
申请人 YAMAMOTO YO;TAKAHASHI HARUO;FUJII TOSHIAKI 发明人 YAMAMOTO YO;TAKAHASHI HARUO;FUJII TOSHIAKI
分类号 H01J37/20 主分类号 H01J37/20
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