发明名称 MAGNETIC TUNNEL JUNCTION STRUCTURE HAVING AN OXIDIZED BUFFER LAYER AND METHOD OF FABRICATING THE SAME
摘要 There are provided a magnetic tunnel junction structure and a method of fabricating the same. The magnetic tunnel junction structure includes a lower electrode, a lower magnetic layer pattern and a tunnel layer pattern, which are sequentially formed on the lower electrode. The magnetic tunnel junction structure further includes an upper magnetic layer pattern, a buffer layer pattern, and an upper electrode, which are sequentially formed on a portion of the tunnel layer pattern. The sidewall of the upper magnetic layer pattern is surrounded by an oxidized upper magnetic layer, and the sidewall of the buffer layer pattern is surrounded by an oxidized buffer layer. The depletion of the upper magnetic layer pattern and the lower magnetic layer pattern in the magnetic tunnel junction region can be prevented by the oxidized buffer layer.
申请公布号 US2007041125(A1) 申请公布日期 2007.02.22
申请号 US20060552085 申请日期 2006.10.23
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 HA YOUNG-KI;LEE JANG-EUN;KIM HYUN-JO;OH SE-CHUNG;BAE JUN-SOO;BAEK IN-GYU
分类号 G11B5/17;G11C11/15;H01L21/00;H01L43/08;H01L43/12 主分类号 G11B5/17
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