| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide effective solution for preventing slurry leakage in polishing pads used for chemical/mechanical polishing device. <P>SOLUTION: This invention is related to a polishing pad for chemical/mechanical polishing device and a method for manufacturing the polishing pad. The polishing pad is composed of an upper layer 66, lower layer 60, a polishing face above the upper layer 66, and transparent sheets 64 made of a material sandwiched between the two layers. Under this arrangement, slurry during the chemical/mechanical polishing work cannot reach the lower layer of the polishing pad by infiltrating through impermeable the transparent sheets. <P>COPYRIGHT: (C)2007,JPO&INPIT |
