| 摘要 |
A process for producing hafnium(III) nitride (HfN) or zirconium nitride coatings by means of the CVD method (chemical vapour deposition) from a reactive gas on a substrate surface, the HfN coating or ZrN coating and their use are described. In the process, a hafnium or zirconium tetrakis(dialkylamide) having the general formula <?in-line-formulae description="In-line Formulae" end="lead"?>Hf(NR<SUP>1</SUP>R<SUP>2</SUP>)<SUB>4 </SUB>or Zr(NR<SUP>1</SUP>R<SUP>2</SUP>)<SUB>4 </SUB><?in-line-formulae description="In-line Formulae" end="tail"?> wherein R<SUP>1 </SUP>and R<SUP>2 </SUP>denote identical or different, straight-chain or branched C<SUB>1 </SUB>to C<SUB>4 </SUB>alkyl radicals, is used as the Hf precursor or Zr precursor and a hydrazine derivative having the general formula <?in-line-formulae description="In-line Formulae" end="lead"?>H<SUB>2</SUB>N-NR<SUP>3</SUP>R<SUP>4 </SUP><?in-line-formulae description="In-line Formulae" end="tail"?> wherein R<SUP>3 </SUP>denotes a straight-chain or branched C<SUB>1 </SUB>to C<SUB>4 </SUB>alkyl radical and R<SUP>4 </SUP>independently denotes a C<SUB>1 </SUB>to C<SUB>4 </SUB>alkyl radical or H, is used as the reactive gas.
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