发明名称 RELUCTANCE SENSOR HAVING ANISOTROPIC HARD BIAS WITHOUT ACCOMPANYING BUFFER LAYER
摘要 PROBLEM TO BE SOLVED: To provide a reluctance sensor having an anisotropic hard bias where a very rigid bias structure of a free layer can be attained, even if it a very small sensor. SOLUTION: Hard magnetic bias layers 338 and 340 are formed on seed layers 342 and 344 subjected to low-voltage ion milling, to cause magnetic anisotropy in the hard magnetic bias layer. The processed seed layer can deposit the hard magnetic bias layers 338 and 340 on a crystalline layer without requiring a buffer layer of Si, or the like, for interrupting epitaxial growth induced by the underlying crystalline layer. Low-voltage ion milling is performed at an angleθwith respect to the normal to the surface of the seed layer. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007049136(A) 申请公布日期 2007.02.22
申请号 JP20060205836 申请日期 2006.07.28
申请人 HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS BV 发明人 FREITAG JAMES MAC;PINARBASI MUSTAFA M
分类号 H01L43/08;G11B5/39;H01L43/12 主分类号 H01L43/08
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