发明名称 Method for manufacturing a zinc oxide thin film at low temperatures
摘要 The present invention provides a method and apparatus for forming a zinc oxide thin film with high transparency and high conductivity on a surface of a flexible substrate such as plastic without the indispensable requirement of doping impurities. In the method of forming a zinc oxide thin film by reacting oxygen radicals and zinc atoms on a surface of a substrate placed in a film-forming chamber evacuated to a vacuum, the density of crystal defects that are defects of the atomic arrangement of the zinc oxide thin film is controlled by the temperature of the substrate, and the zinc oxide thin film is thereby formed. It is suitable to form the film while maintaining the temperature of the substrate at 400°C or less to intentionally disturb the regularity of the atomic arrangement of the zinc oxide thin film.
申请公布号 EP1755154(A1) 申请公布日期 2007.02.21
申请号 EP20060005550 申请日期 2006.03.17
申请人 YAMANASHI UNIVERSITY;YAMANASHI PREFECTURE;NAKAYA LTD 发明人 MATSUMOTO, TAKASHI;IMAZU, CHITAKE;HAGIHARA, SHIGERU;KIJIMA, KAZUHIRO;ABE, OSAMU;HIRAKI, SATOSHI;FUJIKAWA, YUICHIRO
分类号 H01L21/203;C23C14/08;C30B23/02 主分类号 H01L21/203
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