发明名称 Spacer fabrication process for manufacturing reflective stealth mirrors and other MEMS devices
摘要 A method for use in manufacturing a microelectromechanical system, such as a reflective stealth mirror includes the steps of: forming an I-shape mirror structure; forming a spacer layer over the I-shape mirror structure; and patterning the spacer layer to form at least one spacer along a side of the I-shape mirror structure.
申请公布号 US7180651(B2) 申请公布日期 2007.02.20
申请号 US20040002766 申请日期 2004.12.02
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 WU SHAN-HUA;CHEN FEI-YUN;WANG WEI-YA;LIU HUNG-HSIN;PAN SHENG-LIANG
分类号 G02F26/00 主分类号 G02F26/00
代理机构 代理人
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