发明名称 |
Spacer fabrication process for manufacturing reflective stealth mirrors and other MEMS devices |
摘要 |
A method for use in manufacturing a microelectromechanical system, such as a reflective stealth mirror includes the steps of: forming an I-shape mirror structure; forming a spacer layer over the I-shape mirror structure; and patterning the spacer layer to form at least one spacer along a side of the I-shape mirror structure.
|
申请公布号 |
US7180651(B2) |
申请公布日期 |
2007.02.20 |
申请号 |
US20040002766 |
申请日期 |
2004.12.02 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
WU SHAN-HUA;CHEN FEI-YUN;WANG WEI-YA;LIU HUNG-HSIN;PAN SHENG-LIANG |
分类号 |
G02F26/00 |
主分类号 |
G02F26/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|